Desmarais
Yung-Hoon (Sam) Ha Ph.D.

Yung-Hoon (Sam) Ha Ph.D.

Partner, New York
PHONE: 212-351-3411 FAX: 212-351-3401
yha@desmaraisllp.com
Yung-Hoon (Sam) Ha leads Desmarais LLP’s post-grant practice before the USPTO/PTAB.  Dr. Ha’s experience before the PTAB spans a decade and multiple technologies, such as semiconductor fabrication, rechargeable batteries, hearing aids, microprocessor architecture, and software related patents.  Dr. Ha also handles ex parte reexaminations before the USPTO. 
 
In addition, Dr. Ha devotes a significant amount of his efforts on high stakes patent litigation and client counseling.  He has significant experience with all aspects of patent litigation, particularly pre-trial phases of litigation.  He marries his deep technical insights in various technology areas with his expertise in patent law to develop winning case themes for his clients. 
 
In addition, before joining Desmarais LLP, Dr. Ha has prosecuted several hundred patent portfolios, procuring patents for large academic institutions, large corporations, and startup companies alike. He leverages his knowledge of patent prosecution procedures in patent litigation matters to develop creative case themes for his clients.
 
Dr. Ha also currently leads Desmarais LLP’s efforts in developing its Korean practice.
 
Prior to entering the practice of law, Dr. Ha was a research and teaching assistant at MIT.  Dr. Ha has published approximately 10 scientific articles in the field of polymers and biomimetic materials.  He has also served as a peer reviewer for scientific journals and conference proceedings.

Prior Experience

  • Partner, WilmerHale, New York, New York, 2005-2020

Courts

  • United States Court of Appeals for the Federal Circuit
  • United States District Court for the Southern District of New York

Other Distinctions

Recent Selections:
  • IAM Patent 1000: Recommended Inidividual, 2023
  • Managing Intellectual Property's IP STARS: Patent Star, 2023-2025
  • MIP Americas Awards: Nominated for Practitioner of the Year (PTAB), 2023 

Dr. Ha is a named inventor on the following United States patents:
  • Ha, Y.-H., and E.L. Thomas. Cyclic shrinkage of a templated 3D network material, US Patent No. 7,329,377.
  • Ha, Y.-H., N. Nikolov, S.K. Pollack, B.D. Martin, and R. Shashidhar. Optimization methods for synthesis of highly conducting transparent thin polymer films, US Patent No. 7,320,813.

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Representative Matters

  • Successfully invalidated all 371 claims of 10 patents asserted against multiple defendants (in which he represented two of the defendants) in one of the largest IPR proceedings ever brought, thereafter affirmed by the Federal Circuit on all issues
  • Represented a multinational technology company in a patent infringement case in the Eastern District of Texas
  • Represented a multinational technology company before the PTAB over a number of patents related to semiconductor manufacturing devices and processes
  • Successfully represented a multinational technology company before the PTAB over plasma deposition technology
  • Successfully represented three multinational technology companies in a Section 337 proceeding before the ITC filed by a complainant related to interconnect structures
  • Successfully defended a multinational company in a Section 337 proceeding before the ITC filed by another multinational corporation related to digital camera technology.

 

News & Publications

  • WDTX Jury Clears Samsung In $4B Chip Patent Trial -Law360, February 21, 2024
  • Yung-Hoon Ha, Chris E. Scott, Edwin L. Thomas, “Miscible blends of poly(benzoyl paraphenylene) and polycarbonate,” Polymer (2001), Vol. 42, Issue 15, pp. 6463-6472.
  • Yung-Hoon Ha and Edwin L. Thomas, “Deformation Behavior of a Roll-Cast Layered-Silicate/Lamellar Triblock Copolymer Nanocomposite,” Macromolecules (2002), Vol. 35, Issue 11, pp. 4419–4428.
  • Tao Deng, Yung-Hoon Ha, Joy Y. Cheng, C. A. Ross, and Edwin L. Thomas, “Micropatterning of Block Copolymer Solutions,” Langmuir (2002), Vol. 18, Issue 18, pp. 6719-6722.
  • Yung-Hoon Ha, “Hierarchical layered-silicate—lamellar triblock copolymer nanocomposites,” Ph.D. Thesis--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, February 2003.
  • Yung-Hoon Ha, Nikolay Nikolov, Charles Dulcey, Shi-Cheng Wang, John Mastrangelo, Ranganathan Shashidhar, “Conductivity tuning of poly(3,4-ethylenedioxythiophene) through side-group cleavage,” Synthetic Metals (2004), Vol. 144, Issue 1, pp. 101-105.
  • Y.-H. Ha, R. A. Vaia, W. F. Lynn, J. P. Costantino, J. Shin, A. B. Smith, P. T. Matsudaira, E. L. Thomas, “Three-Dimensional Network Photonic Crystals via Cyclic Size Reduction/ Infiltration of Sea Urchin Exoskeleton,” Advanced Materials, (2004) Vol. 16, Issue 13, pp. 1091-1094.
  • Y.-H. Ha, N. Nikolov, S. K. Pollack, J. Mastrangelo, B. D. Martin, R. Shashidhar, “Towards a Transparent, Highly Conductive Poly(3,4-ethylenedioxythiophene),” Advanced Functional Materials, (2004), Vol. 14, Issue 6, pp. 615-622
  • Yung-Hoon Ha, Younghwan Kwon, Thomas Breiner, Edwin P. Chan, Theodora Tzianetopoulou, Robert E. Cohen, Mary C. Boyce, and Edwin L. Thomas, “An Orientationally Ordered Hierarchical Exfoliated Clay−Block Copolymer Nanocomposite,” Macromolecules (2005), Vol. 38, Issue 12, pp. 5170–5179.
  • Corey J. Radloff, Shane B. Juhl, Richard A. Vaia, Jason Brunton, Vernon Ward, James Kalmakoff, Terje Dokland, Yung-Hoon Ha, Edwin L. Thomas, “Bio-scaffolds for ordered nanostructures and metallodielectric nanoparticles,” Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications (2005)
  • S. B. Juhl, E. P. Chan, Y.-H. Ha, M. Maldovan, J. Brunton, V. Ward, T. Dokland, J. Kalmakoff, B. Farmer, E. L. Thomas, R. A. Vaia, “Assembly of Wiseana Iridovirus: Viruses for Colloidal Photonic Crystals,” Advanced Functional Materials, (2006) Vol. 16, Issue 8, pp. 1086-1094.

EDUCATION

Fordham University School of Law, JD, 2009

Massachusetts Institute of Technology, PhD, Materials Science and Engineering, 2002

Cornell University, BSc, Materials Science and Engineering, 1997, cum laude and with honors

ADMISSIONS

2009, New York

Registered to practice before the United States Patent and Trademark Office

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